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[1]许 亮,洪瑞金,温和瑞.钨掺杂氧化锌薄膜的结构与光学性能的研究[J].有色金属科学与工程,2011,(05):32-35.
 XU Liang,HONG Rui-jin,WEN He-rui.Study on the effects of tungsten doping on the structure and optical properties of ZnO thin films[J].,2011,(05):32-35.
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钨掺杂氧化锌薄膜的结构与光学性能的研究(/HTML)
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《有色金属科学与工程》[ISSN:1674-9669/CN:36-1311/TF]

卷:
期数:
2011年05期
页码:
32-35
栏目:
出版日期:
2011-10-30

文章信息/Info

Title:
Study on the effects of tungsten doping on the structure and optical properties of ZnO thin films
作者:
许 亮 洪瑞金 温和瑞
江西理工大学冶金与化学工程学院,江西 赣州 341000
Author(s):
XU Liang HONG Rui-jin WEN He-rui
School of Metallurgy and Chemical Engineering, Jiangxi University of Science and Technology,Ganzhou 341000,China
关键词:
钨掺杂氧化锌薄膜溶胶-凝胶法光致发光
分类号:
TF125.2;TG146.4
DOI:
-
文献标志码:
A
摘要:
实验采用溶胶-凝胶法在石英玻璃衬底上制备了掺杂不同钨离子浓度氧化锌薄膜.研究了钨离子的浓度变化对氧化锌薄膜结构与光学性能的影响.测试结果表明,钨离子的掺入使氧化锌薄膜的晶体质量得到提高,衍射峰位置向低衍射角度方向移动,导致薄膜的光学带边发生收缩,即产生“红移”现象.随着钨离子浓度增加,氧化锌薄膜光致发光强度表现为先增加而后出现浓度淬灭现象.

参考文献/References:

[1] Fortunato E, Barquinha P, Pimentel A, et al. Recent advances in ZnO transparent thin film transistors[J]. Thin Solid Films, 2005, 487:205-211.
[2] Soki T, Hatanaka Y, Look D C. ZnO diode fabricated by excimer- laser doping [J]. Appl. Phys. Lett., 2000, 76: 3257-3258.
[3] Sahu D R, Huang Jow-Lay. Development of ZnO-based transparent conductive coatings [J]. Solar Energy Materials & Solar Cells, 2009, 93: 1923-1927.
[4] Wen L B, Huang Y W, Li S B. The measurement of the trace Li content and distribution in ZnO films and the thickness of these films [J]. J Appl Phys,1987, 62:2295-2297.
[5] ■zgür ■, Alivov Ya I, Liu C, et al. A comprehensive review of ZnO materials and devices [J]. J Appl Phys, 2005, 98 (4):1301.
[6] Chen M, Pei Z L, Wan h X, et al. Structural, electrical, and optical properties of transparent conductive oxide ZnO∶Al films prepared by de magnetron reactive sputtering [J]. J Vac Sci Technol, 2001, A19(3): 963-970.
[7] Minami T. Transparent conducting oxide semiconductors for transpar- ent electrodes [J]. Semicond Sci Technol, 2005, 20: S35.
[8] Suresh A, Novak S, Wellenius, et al. Transparent indium callium zinc oxide transistor based floating gate memory with platinum nanoparticles in the gate dielectric[J]. Appl Phys Lett, 2009, 94: 123501.
[9] Sukhvinder Singh, Srinivasa R S, Major S S. Effect of substrate temperature on the structure and optical properties of ZnO thin films deposited by reactive rf magnetron sputtering[J].Thin Solid Films,2007, 515: 8718-8722.
[10] Shan F K, Yu Y S. Optical properties of pure and A-Doped ZnO thin films fabricated with plasma produced by evcimer laser[J]. Thin Solid Films, 2003, 435: 174-178.
[11] Hu J H,Gordon R G.Textured alumni-doped zinc oxide thin films from atmospherics pressure chemical-vapor deposition[J]. J Appl Phys,2002, 7l(2): 880-890.
[12] Benny Joseph, Gopchandran K G, Thomas R V. A study on the chemical spray deposition of zinc oxide thin films and their structural and electrical properties[J].Materials Chemistry and Physics, 1999,58: 71-77.
[13] Zhu Z Q, Li A Z. Molecular beam epitaxy of ZnO for photonic application[J]. Function Materials and Devices, 1999, 5(3): 161-168.
[14] Kamalasanan M N, Chandra S. Sol-gel synthesis of ZnO thin film [J]. Thin Solid Films, 1996, 288: 112-115.
[15] Lefort Mathias, Popa Gabriela, Seyrek Emek, et al. Spray-on organic /inorganic films: a general method for the formation of functional nano- to microscale coatings [J]. Angew Chem Int Ed., 2010, 49: 1-5.
[16] Fujimura N, Nishihara T,Goto S. Control of preferred orientation for ZnOx films: control of self-texture [J]. J Cryst Growth,1993, (130): 269-279.
[17] Bachafi E M, Baud G, Ben Anlor S, et a1.Structural and optical properties of sputtered ZnO films [J]. Thin Solid Films, 1999, 348: 165-172.
[18] Burstein Elias. Anomalous optical absorption limit in InSb [J]. Phys. Rev. 1954, 93: 632-633.
[19] Chen Yefan, Bagnall D M, Koh Hang-jun, et al. Plasma assisted molecular beam epitaxy of ZnO on c-plane sapphire: growth and characterization [J]. J Appl Phys, 1998, 84: 3912-3918.
[20] Shionoya S, Yen W M. Phosphor handbook[M]. Cleveland: CRC,1999.
[21] HONG Rui-jin, WEN He-rui, LIU Cai-ming, et al. Dopant concentration cependence of structure, optical, and magnetic properties of ZnO:Fe thin films [J]. Journal of Crystal Growth, 2011, 314: 30-33.

相似文献/References:

[1]许亮,洪瑞金,温和瑞.钨掺杂氧化锌薄膜的结构与光学性能的研究*[J].有色金属科学与工程,2016,(05预):1815.
 Liang Xu,Ruijin Hong,Herui Wen.Study on the effects of tungsten doping on the structure and optical properties of ZnO thin films[J].,2016,(05):1815.

备注/Memo

备注/Memo:
收稿日期:2011-09-29基金项目:江西省自然科学基金资助项目(2009GZH0037,2010GZC0062)作者简介:许 亮(1985- ),男,硕士,主要从事低成本太阳能电池用透明导片薄膜的制备与性能研究, E-mail: Xu-liang1985@126.com.通信作者:温和瑞(1964-     ),男,教授,博士,主要从事配位化学和功能分子材料方面研究,E-mail:wenhr@mail.jxust.cn.
更新日期/Last Update: 2011-11-07